The reason why 0.01nm semiconductors have become possible.JPG
Currently, the semiconductor industry has concluded that production below 2nm is impossible.
The first reason is that the size of light can no longer be reduced,
and the second reason is the issue of leakage current.
However, a solution does exist.
In the current semiconductor process, when patterning a wafer, it is called the photolithography process,
where light is shone through a mask containing the circuit pattern,
and the reflected light reacts with the photoresist on the wafer to draw the circuit.
Therefore, if we can only reduce the size of light, we can make things 1 trillion times smaller than 1nm.
So, is there no way to reduce the size of light further?
That would be to install an ND1000000 lens filter, which reduces the light density to 1/1,000,000, in the path where the light reflected from the mask passes.
Then, the density of the light passing through the lens filter is reduced to 1/1,000,000.
If the point where the light forms an image is pushed back by just 0.01cm while the light density is lowered,
the light image becomes 1/1,000,000 times smaller.
In other words, you reduce the light density to match the reduction ratio.
In the photoresist that reacts to the light reduced by 1/1,000,000, a substance 1/1,000,000 times smaller is created,
resulting in a substance 1 million times smaller than 1nm.
It cannot be confirmed with the naked eye, and it can be made 1 million times smaller than 1nm.
Of course, if the absolute minimum size of light is 0.00000001nm, it cannot be made smaller than that.
This is what is called the physical limit.
The light transmitted through the mask is concentrated at a specific point by a b1 convex lens, passes through the ND1000000 lens filter A1,
reducing the light density, then the light is concentrated by the C1 contact lens, and is again absorbed by the B2 convex lens
to be reduced and pattern the wafer.
However, if the substance created by the light reacting with the photoresist is 0.00001nm, which is smaller than the size of an atom,
one might ask if such a substance can even be created.
But the size of an atom is a standard for an independent atom in a gaseous state.
In liquid or solid states, it can be made even smaller.
By mixing carbon ions and nano-carbon powder into a liquefied ingot and cooling it under ultra-high pressure,
one can create an ultra-high-density nano-carbon ion quantum semiconductor.
And this is a future technology that must be developed and manufactured after 0.1nm semiconductors are developed.
Like a capacitor, if you place an insulator and create an electric field by increasing the electron voltage on one side,
you can coat the front of the insulator with ultra-high-density hydrogen ions to fill the entire area with 0.00001nm hydrogen ions,
making the density and concentration reach the 0.00001nm level. In this state, you etch, create covalent bonds with the hydrogen ions,
and then release the capacitor voltage. In fact, it was just a matter of being able to reduce the size of light.
There is also a method of carving it out after solidifying the photoresist with light,
leading to an era of 0.000001nm that cannot be visually seen with current optical instruments.
Every time the lens filter reduction process is increased once, it becomes 1 million times smaller;
after two processes, it becomes 1 trillion times smaller, and after three processes, it becomes 100 quintillion times smaller.
This is possible in the world of optics.
What is the minimum unit of light?
Substances can be made as small as that unit.
The reason leakage current occurs is that as the charge in the capacitor is sent to the resistor, it converts to heat, opening the oxide layer,
and leakage current occurs from that oxide layer. To solve this, one could make the capacitor charge by sending the charge to a battery instead of a resistor,
or coat the capacitor area with graphene to dissipate heat immediately so that the oxide layer does not expand by maintaining a low temperature.
This is a problem that can be solved if non-heating semiconductors are released.
The problem of microscopic voids can be prevented by injecting an insulating liquid to stop leakage.
This obstructs the flow of electrons.
0.1nm might be possible within 10 years.
Or it might not be possible even after 1,000 years.
No one knows for sure.
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